Client: R.F. Micro Devices
Project: Fab III
Project Type: New Construction
Industry: Microelectronic Cleanrooms
Project Highlights
- 30,000 SF central plant
- 60 foot deep 100' x 100' waste treatment facility
- 4,370 SF Class 10 cleanroom, 930 SF Class 100 cleanroom, 5,192 s/f Class 1000 cleanroom
- Fast-track, 11-month construction groundbreaking to tool install
- Raised access floor over recessed slab, 14' W x 14' C utility tunnel
- Clear span 18' deep trusses over Fab
- Electron grade 1 DI water system 400 g.p.m.
- Full UPS and emergency generator back-up
- Semiconductor cleanroom
- Cleanroom construction general contractor
- Included separate utilities building which included chillers, boilers, vacuum pumps and compressed our systems
- Waste treatment for acid, solvent and arsenic waste
- Complete construction of a Greenfield cleanroom facility
- Construction Manager
- Designer: Lockwood Greene
Similar Hodess Projects
- RF Micro Devices Fab II Phase I, Greensboro, NC
- Stocker Yale, Salem, NH
- Scitex Digital Printing, Kettering, Ohio
- Tiffany & Co., Cumberland, RI
- University of Maryland, LPS Cleanroom, Baltimore, Maryland
- Nortel (formerly Coretek), Wilmington, MA
- Trinity Moline Hospital, USP 797 Pharmacy Suite, Moline, Illinois
- Johnson Controls Inc. /Saft, Holland, MI
- BAE Microwave East Cleanroom Upgrade, Nashua, NH
- Unitrode Fab III, Merrimack, NH
- LG Chemical / Compact Power Inc., Holland, MI
- Rohm and Hass (formerly Shipley), Marlboro, MA
- University of Rhode Island Center for Atmospheric Chemistry Studies, Narragansett, RI
- General Electric Healthcare Digital X-Ray Detector Facility, East Greenbush, NY
- Collagen Matrix, Franklin Lakes, NJ