Client: Unitrode
Project: Fab III
Project Type: Design/Build
Industry: Microelectronic Cleanrooms
Project Highlights
- Size: 20,000 sf
- Class 10, Class 100 and Class 1,000 areas
- Depressed slabs and raised access floors for a ducted supply and return chase air system
- HCC provided new gas bunkers and storage and relocated the nitrogen and hydrogen plants and created a new nitrogen and hydrogen station
- Custom vaneaxial fans were used for the recirculation units and new make-up air units, scrubber and solvent exhaust fans were place on roof
- New CDA system with duplicate back up through entire plant
- Doubled the size of the DI water systems and added new process vacuum, three new process cooling water systems, one standard system, one zero back pressure system and one low resistivity system
- Value: $16,000,000
- Design/Build
- Engineer: Am-Tech
- Architect: SMRT
Similar Hodess Projects
- Polyclad Corporation, Franklin, NH
- Digital Equipment Corp. Fab 4 Annex Phase 1-3, Hudson, MA
- Hodess' Cleanroom at GE Healthcare Achieves LEED Gold Certification
- Teradyne Northeast Blvd., Nashua, NH
- Raytheon ETL SAT Com, Marlboro, MA
- Test Project
- Fuji Film Microelectronic Materials, Quonset, RI
- Brown University, Barrus & Holley Microelectronic Center, Providence, RI
- Polytop Corporation, Slatersville, RI
- General Electric Healthcare Digital X-Ray Detector Facility, East Greenbush, NY
- Solasta, Newton, MA
- RF Micro Devices Fab II Phase I, Greensboro, NC
- BAE Systems AIX HVPE Tool Install, Nashua, NH
- SVG Lithography, Multiple Projects, Ridgefield and Wilton, CT
- University of Connecticut School of Engineering, Storrs, CT
